When the complete wafer is exposed ... To be successful the alignment of the two mask exposures is critical, and as twice as many mask exposures are required, throughput is approximately halved.

The EVG ® 610 mask alignment system from EVG Group supports a wide range of standard lithography processes, like soft-, hard-, vacuum-, and proximity exposure modes, including the option of back-side ...

Capable of exposing both masks (including templates) and wafers, the SB3050-2 exposure tools are ideal for bridging the gap between next-generation technology nodes. A high-precision stage system, a ...